Comparison ledger
Applied Materials 0010-13622 RF Match for, Lam Research Concept Two Speed NExT, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Concept Two Speed NExTLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Lam Research Concept Two |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | Concept Two Speed NExT[3] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Wafer Shape | — | Notch[2] |
| SMIF Interface | — | Yes[2] |
| Cassette Loader | — | LPI 2200[2] |
| Loadlock Indexer Robot | — | Indexer II[2] |
| PEC slot | — | MPS with one cool station[2] |
| Main power distributer | — | PDP[2] |
| System Main Power | — | 3￠5Wires 208V[2] |
| System UPS Power | — | Yes[2] |
| Loadlock Baratron Model | — | MKS[2] |
| Split Insert | — | Yes[2] |
| Slit Valve Type | — | SMC L-Motion[2] |
| TM Turbo Pump Model | — | Pfeiffer TC 400 E74[2] |
| TM Throttle Valve Model | — | MKS[2] |
| TM Baratron Model | — | MKS[2] |
| IOC Version | — | V 4.4[2] |
| TM Robot Type | — | Mag 7 with Center Finder[2] |
| TMRobot Blade | — | Metal[2] |
| Wafer sensor | — | Existence[2] |
| EMO's | — | Push Button/turn to release[2] |
| Front Monitor | — | 15 inch[2] |
| OEM | — | Lam Research[3] |
| Category | — | Deposition[3] |
| Process type | — | CVD (Chemical Vapor Deposition)[3] |
| Wafer size | — | 8 inch[3] |
| Software revision | — | 5.502 B26[2] |
| Signal tower | — | Yes[2] |
| Module controller | — | MC4X[2] |
| Host interface | — | SECS / GEM[2] |
| MFC1 Ar/He | — | 1000sccm Ar / Brooks 5866[2] |
| MFC2 Ar/He | — | 1000sccm Ar / Brooks 5866[2] |
| MFC3 Ar/He | — | 500sccm Ar / Brooks GF120C[2] |
| Chamber type | — | Nanofill[2] |
| Chamber process | — | IMD + Multistep[2] |
| Process clean type | — | RPC[2] |
| Dome type | — | High Power Dome with Multi Frequency[2] |
| ESC type | — | Duratek mc Notch 6 Pin[2] |
| Nanofill ESC guard ring | — | Notch[2] |
| Module turbo pump | — | Adixen ATP 2300M[2] |
| Manometer 1 (10T) | — | MKS[2] |
| Throttle valve | — | MKS[2] |
| Temp monitoring | — | NTM Delta with ATC: ATC option[2] |
| Manometer 2 (20T) | — | MKS[2] |
| HF generator | — | AE Paramount 6013[2] |
| MF generator | — | AE Paramount 5KW[2] |
| LF generator | — | AE Paramount 5KW[2] |
| RF match | — | AE MERCURY 3013[2] |
| Manometer 3 (100m) | — | MKS[2] |
| IOC version | — | V 4.21[2] |
| End point detector | — | OES EPD: Verity SD2048XL-T[2] |
| Heat exchanger type | — | SMC[2] |
| Dual clean injector kit | — | RPC with one nozzle[2] |
| TM robot blade | — | Metal[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →