Lam Research

Concept Two Speed NExT

Deposition Lam Research Concept Two family

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The Lam Research Concept Two Speed NExT is a CVD system for 8-inch wafers. The Lam Research Concept Two Speed NExT is categorized as a deposition tool. The Lam Research Concept Two Speed NExT includes a 3￠5Wires 208V main power specification.^[1]^[2]

Concept Two Speed NExT — Inventory photo — Fig. 01Concept Two Speed NExTInventory photo^[2]

Power

3￠5Wires 208V^[2]

Vacuum

Pfeiffer TC 400 E74^[2]

Gas delivery

CVD (Chemical Vapor Deposition)^[1]

Optics

OES EPD: Verity SD2048XL-T^[2]

What it is

The Lam Research Concept Two Speed NExT is a chemical vapor deposition system for eight-inch wafers.^[1]^[3]

How it works

The Concept Two Speed NExT is configured with a wafer-handling path that includes a cassette loader, a loadlock indexer robot, a transfer-module robot, and a SMIF interface.^[2]^[1]^[4]

The Concept Two Speed NExT includes process-module hardware such as a Nanofill chamber, a high-power dome with multi-frequency operation, multiple mass-flow controllers, vacuum pumping, throttle-valve control, and optical end-point detection.^[2]^[4]

Where it fits in the process flow

The Concept Two Speed NExT has a chamber process described as IMD plus multistep.^[2]^[4]

Applications

The Concept Two Speed NExT is used for eight-inch wafer deposition work.^[1]^[3]

The Concept Two Speed NExT is configured for IMD and multistep processing.^[2]^[4]

What do the numbers mean?

Power & electrical5

System Main Power: 3￠5Wires 208V^[2]
HF generator: AE Paramount 6013^[2]
MF generator: AE Paramount 5KW^[2]
LF generator: AE Paramount 5KW^[2]
RF match: AE MERCURY 3013^[2]

Vacuum & pumping2

TM Turbo Pump Model: Pfeiffer TC 400 E74^[2]
Module turbo pump: Adixen ATP 2300M^[2]

Wafer handling9

Wafer Shape: Notch^[2]
Cassette Loader: LPI 2200^[2]
Loadlock Indexer Robot: Indexer II^[2]
Loadlock Baratron Model: MKS^[2]
TM Robot Type: Mag 7 with Center Finder^[2]
TMRobot Blade: Metal^[2]
Wafer sensor: Existence^[2]
Wafer size: 8 inch^[1]
TM robot blade: Metal^[2]

Gas & chemistry1

Process type: CVD (Chemical Vapor Deposition)^[1]

Optics & imaging1

End point detector: OES EPD: Verity SD2048XL-T^[2]

Control & software5

SMIF Interface: Yes^[2]
Software revision: 5.502 B26^[2]
Module controller: MC4X^[2]
Host interface: SECS / GEM^[2]
Host interface: SECS / GEM DLCM^[2]

Configuration & options31

PEC slot: MPS with one cool station^[2]
Main power distributer: PDP^[2]
System UPS Power: Yes^[2]
Split Insert: Yes^[2]
Slit Valve Type: SMC L-Motion^[2]
TM Throttle Valve Model: MKS^[2]
TM Baratron Model: MKS^[2]
IOC Version: V 4.4^[2]
EMO's: Push Button/turn to release^[2]
Front Monitor: 15 inch^[2]
OEM: Lam Research^[1]
Model: Concept Two Speed NExT^[1]
Category: Deposition^[1]
Signal tower: Yes^[2]
MFC1 Ar/He: 1000sccm Ar / Brooks 5866^[2]
MFC2 Ar/He: 1000sccm Ar / Brooks 5866^[2]
MFC3 Ar/He: 500sccm Ar / Brooks GF120C^[2]
Chamber type: Nanofill^[2]
Chamber process: IMD + Multistep^[2]
Process clean type: RPC^[2]
Dome type: High Power Dome with Multi Frequency^[2]
ESC type: Duratek mc Notch 6 Pin^[2]
Nanofill ESC guard ring: Notch^[2]
Manometer 1 (10T): MKS^[2]
Throttle valve: MKS^[2]
Temp monitoring: NTM Delta with ATC: ATC option^[2]
Manometer 2 (20T): MKS^[2]
Manometer 3 (100m): MKS^[2]
IOC version: V 4.21^[2]
Heat exchanger type: SMC^[2]
Dual clean injector kit: RPC with one nozzle^[2]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

System Main Power3￠5Wires 208V^[2]
TM Turbo Pump ModelPfeiffer TC 400 E74^[2]
Process typeCVD (Chemical Vapor Deposition)^[1]
Module turbo pumpAdixen ATP 2300M^[2]
HF generatorAE Paramount 6013^[2]
MF generatorAE Paramount 5KW^[2]
LF generatorAE Paramount 5KW^[2]
RF matchAE MERCURY 3013^[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What wafer size does the Concept Two Speed NExT support?

The Concept Two Speed NExT is a system for eight-inch wafers.^[1]^[3]

What process type does the Concept Two Speed NExT use?

The Concept Two Speed NExT uses chemical vapor deposition.^[1]^[3]

What major wafer-handling elements are included on the Concept Two Speed NExT?

The Concept Two Speed NExT includes a SMIF interface, a cassette loader, a loadlock indexer robot, and a transfer-module robot.^[1]^[2]^[4]

Not publicly documented

The following facts about the Concept Two Speed NExT are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Concept Two Speed NExT are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Concept Two Speed NExT are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Concept Two Speed NExT are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Concept Two Speed NExT are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Concept Two Speed NExT is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources

[1]waferpedia.com — waferpedia.comwaferpedia.com
[2]Inventory photo
[3]Lam Research Concept Two family | Waferpedia — waferpedia.comwaferpedia.com
[4]Novellus / Lam Concept Two Speed NExT CVD 8 | SemiStar — semistarcorp.comsemistarcorp.com