Waferpedia

Comparison ledger

0010-13627 High Efficiency RF MatchversusCentura 5200 Mainframe

Applied Materials 0010-13627 High Efficiency RF Match, Applied Materials Centura 5200 Mainframe, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
Centura 5200 MainframeApplied Materials
OEMApplied MaterialsApplied Materials
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchApplied Materials Centura 5200
Specifications
ConfigurationHE, BIAS[1]Parts Machine[3]
Asset Number70430[2]—
TypeHigh Efficiency RF Match - HE, BIAS[2]—
OEMApplied Materials[2]Applied Materials[3]
Model0010-13627[2]Centura 5200[3]
Asset #—125703[3]
Description—Parts machine[3]

Plan your fab

Building a Lab & Support Equipment process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing