Applied Materials
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The Applied Materials Centura 5200 Mainframe is a multi-chamber mainframe platform for semiconductor wafer processing. The Centura 5200 uses a VME-based control system and VHP (Vacuum Handling Platform) manipulators for wafer handling.[1][2]

The VME control rack in the Centura 5200 Mainframe handles system communication and can experience signal delays due to aging capacitors. The VHP manipulator uses a motor-driven arm whose torque output can be monitored to predict belt wear or bearing issues. Loadlock chambers are sealed with slit valves; leakage can occur from flange deformation, requiring laser flatness scanning and sealing ring compensation.[2]
Documented failure modes, common issues, and field considerations.
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The following facts about the Centura 5200 Mainframe are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Centura 5200 Mainframe are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 Mainframe are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura 5200 Mainframe are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura 5200 Mainframe are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Centura 5200 Mainframe is not on record.
Answerable by: an OEM datasheet or a fab qualification report
Last updated Sep 1, 2026.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.