Comparison ledger
Applied Materials 0010-13627 High Efficiency RF Match, Semitool R 208 FMC 2, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13627 High Efficiency RF MatchApplied Materials | R 208 FMC 2Semitool |
|---|---|---|
| OEM | Applied Materials | Semitool |
| Category | Lab & Support Equipment | Lab & Support Equipment |
| Wafer size | — | Single wafer |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13627 High Efficiency RF Match | Semitool R 208 FMC 2 |
| Specifications | ||
| Configuration | HE, BIAS[1] | DHF, NH4OH, H2O2, H2SO4, IPA[4] |
| Asset Number | 70430[2] | — |
| Type | High Efficiency RF Match - HE, BIAS[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-13627[2] | R 208 FMC 2[3] |
| Wafer size | — | Single wafer[3] |
| OS | — | Windows NT[4] |
| Manufacturer | — | Semitool[3] |
| Category | — | Lab & Support Equipment[3] |
| Control system | — | Windows NT[4] |
| Bowls / cabinet | — | 4 bowls, 2ea LD - Chemical cabinet[4] |
| Gas delivery / support | — | Ozone Gen., Pump, Chiller[3] |
| Status note | — | Bowl is off-line[4] |
| Process chemistry | — | DHF, NH4OH, H2O2, H2SO4, IPA[4] |
| Vintage | — | 2005[4] |
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