Semitool
R 208 FMC 2
The Semitool R 208 FMC 2 is a lab and support equipment system. The Semitool R 208 FMC 2 is configured as a single-wafer system. The Semitool R 208 FMC 2 uses Windows NT.[1][2]
What it is
How it works
Where it fits in the process flow
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Bowl is off-line
What do the numbers mean?
Vacuum & pumping2
- Pump[2]
Wafer handling1
Gas & chemistry3
- 4 bowls, 2ea LD - Chemical cabinet[2]
Control & software1
Configuration & options10
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What types of chemistries can this class of machine handle?General reference — not yet source-verified
Wet chemical processing stations of this class are typically designed with corrosion-resistant fluid paths so that they can handle a range of acids, bases, solvents, and aqueous solutions. The exact compatibility depends on the installed wetted materials and system configuration.
Is this type of machine automated or manual?General reference — not yet source-verified
Machines in this class are often semi-automated, with manual loading and unloading but automated control of chemical delivery, process time, rinsing, and drying. The degree of automation can vary from basic timer-based operation to recipe-driven process control.
What should an engineer check before using such a system?General reference — not yet source-verified
An engineer should check the compatibility of the workpiece carrier and process chamber with the intended chemistry, confirm that the rinse and exhaust systems are functioning, and ensure that the process recipe matches the desired etch rate, cleaning effect, or strip performance.
Not publicly documented
The following facts about the R 208 FMC 2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the R 208 FMC 2 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the R 208 FMC 2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the R 208 FMC 2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the R 208 FMC 2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the R 208 FMC 2 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]inventory listing
- [3]Semitool R 208 FMC 2 family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 13, 2026.
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