Comparison ledger
Applied Materials 0010-16392 ESC Assembly, Oxford Instruments 80-etch, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-16392 ESC AssemblyApplied Materials | 80-etchOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-16392 ESC Assembly | Oxford Instruments 80-etch |
| Specifications | ||
| OEM | Applied Materials[1] | Oxford Instruments[3] |
| Model | 0010-16392[1] | 80-etch[3] |
| Type | ESC Assembly[1] | — |
| Wafer Size | 300 mm[2] | — |
| Electrode Configuration | Dual[2] | — |
| S/N | — | 9M69591A[3] |
| Controller arrangement | — | One controller for both RIE and PECVD[3] |
| PECVD capabilities | — | Amorphous Si, Si3N4, SiONx, SiO2[3] |
| Source gases available | — | SiH4, N2, N2O, NH3, Ar[3] |
| Category | — | Etch[4] |
| Process use | — | Wafer or thin film etching/patterning[3] |
| Serial number | — | 9M69591A[3] |
| Source gases | — | SiH4, N2, N2O, NH3, Ar[3] |
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