Comparison ledger
Applied Materials 0010-16392 ESC Assembly, Plasma-Therm RIE790, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-16392 ESC AssemblyApplied Materials | RIE790Plasma-Therm |
|---|---|---|
| OEM | Applied Materials | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-16392 ESC Assembly | Plasma-Therm RIE790 |
| Specifications | ||
| OEM | Applied Materials[1] | — |
| Model | 0010-16392[1] | RIE790[3] |
| Type | ESC Assembly[1] | — |
| Wafer Size | 300 mm[2] | — |
| Electrode Configuration | Dual[2] | — |
| Manufacturer | — | PlasmaTherm[3] |
| Process type | — | Reactive ion etch (RIE)[3] |
| Reactor type | — | Parallel plate[3] |
| Chemistries | — | SF6, CHF3, CF4, O2, Ar[3] |
| Etch targets | — | Semiconductors, dielectrics, metals[3] |
| Restriction | — | None[3] |
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