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0010-22161 High EFF RF MatchversusAleris 8350 Film Thickness Measurement

Applied Materials 0010-22161 High EFF RF Match, KLA Aleris 8350 Film Thickness Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsKLA
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
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FamilyApplied Materials 0010-22161 High EFF RF MatchKLA Aleris 8350 Film Thickness Measurement
Specifications
MakeApplied Materials[1]KLA[3]
Model0010-22161[1]Aleris 8350[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Wafer sizes—12 inch[3]
Asset ID—227861[4]
Currently configured for—300mm[4]
Current equipment status—Available[4]
Input voltage—208VAC/230VAC[4]
Communications—Full Automation (E40, E84, E87, E90, E94)[4]
Measurement capabilities—Film thickness, film reflectivity, index of refraction (N or RI)[4]
Wafer size—12 inch[3]
Configured for—300mm[4]
System hardware—17" color monitor; P4 Computer / Windows XP; CD-Rom Drive[4]
Power—AC Power Supply (Input Voltage: 208VAC/230VAC)[4]
FOUP loadports—Sinfonia Selop6 Serires[4]
Dual loadport wafer handler—Yaskawa handling system[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]macquarie.commacquarie.com