Waferpedia

Comparison ledger

0010-22161 High EFF RF MatchversusAlliance A 6 9400 DSIE III Process

Applied Materials 0010-22161 High EFF RF Match, Lam Research Alliance A 6 9400 DSIE III Process, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsLam Research
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—2015 Refurbishment
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchLam Research Alliance
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Configuration—50/60 Hz[3]
Voltage—208Vac[3]
Full Load Current—43 amps[3]
Phase—3 Phase[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]inventory listing