Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Onto Innovation AFT 4000 Film Thickness Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | AFT 4000 Film Thickness MeasurementOnto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Onto Innovation AFT 4000 Film Thickness Measurement |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Wavelength Range | — | Visible 400-900[3] |
| Configuration | — | nm[3] |
| Wafer diameter(s) | — | 100 mm, 150 mm[5] |
| Wafer holder | — | delrin[5] |
| Wafer materials | — | silicon[5] |
| Wafer thickness | — | 200 .. 1000 µm[5] |