Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Ulvac SOPHI 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | SOPHI 200Ulvac |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Ulvac SOPHI 200 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Category | — | Ion Implantation[3] |
| Beam current | — | ~500 μA[3] |
| Throughput | — | more than 100 pieces/h (6in)[3] |
| Dose range | — | actual dose 10^10~10^14 ions/cm2[3] |