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0010-47763 ASSY ESC Bonded Monopolar Dual Heatedversus850 LT SOI Fusion Wafer

Applied Materials 0010-47763 ASSY ESC Bonded Monopolar Dual Heated, EV Group 850 LT SOI Fusion Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsEV Group
CategoryPackaging & BondingPackaging & Bonding
Wafer size—200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-47763 ASSY ESC Bonded Monopolar Dual HeatedEV Group 850
Specifications
ConfigurationRefurbished[1]Fully-Automatic[2]
Wafer size—Suitable for wafer sizes up to 8"/200mm wafers[2]
OEM—EV Group[3]
Model—850 LT SOI Fusion Wafer[2]
Category—Packaging & Bonding[3]
Automation—Fully-automatic[3]
Cleaning module—One Cleaning Module[2]
Spinner chuck—One Spinner Chuck for 8”/200mm wafers[2]
DI water dispense line—One DI Water Dispense Line[2]
Robot / pre-aligner—One Genmark Robot with pre-aligner[2]
Low-temperature plasma activation module—One LowTemp Plasma Activation Module[2]
High-frequency RF generator—High Frequency RF Generator with Matching Unit[2]
Low-frequency RF generator—Low Frequency RF Generator with Matching Unit[2]
Control interface—PC controlled with windows based graphical user interface[2]
Access control—Password protected access levels[2]
Cleaning speed—Programmable rotational speed for substrate cleaning[2]
Configured wafer size—8-inch/200mm wafers[2]
Plasma activation module—One LowTemp Plasma Activation Module[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com