Comparison ledger
Applied Materials 0010 47763, Lam Research Rainbow 4420, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Rainbow 4420Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1994 Vintage year |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Rainbow 4420 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 2nd Source New[2] | Refurbished[5] |
| Type | Monopolar Dual Heated[3] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[4] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Model | 0010-47763[2] | — |
| OEM | Applied Materials[2] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[3] | — |
| Quantity available (source) | 1[3] | — |
| Software version | — | Envision 1.5 Release[1] |
| Handler System | — | Harmonics Arm (2)[1] |
| Volts | — | 208[1] |
| Wafer Shape | — | 8" flat zone[6] |
| Process | — | Poly Etch[6] |
| Software | — | Envision 1.5[6] |
| Wafer Aligner | — | Universal[7] |
| Wafer Sizes | — | 8 inch[1] |
| Software Version | — | Envision 1.5[1] |
| CIM SECS | — | Yes[1] |
| Factory Interface | — | SMIF (2)[1] |
| LL Pump | — | Yes[1] |
| TCU 2080 | — | Yes[1] |
| AC Rack | — | Yes[1] |
| PC Pump | — | Yes[1] |
| Vintage | — | 1994[1] |
| Dry Pump | — | Yes[6] |
| Chiller | — | Yes[6] |
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