Waferpedia

Comparison ledger

0020 17484 PartversusConcept Three

Applied Materials 0020 17484 Part, Lam Research Concept Three, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
Concept ThreeLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartLam Research Concept Three
Cited variants—
  • Concept Three Speed[1]
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[2]Speed 999[3]
Equipment type—CVD (Chemical Vapor Deposition) deposition system[4]
Category—Deposition[1]
Variant—Concept Three Speed is a CVD deposition system for 12-inch wafers[1]
Wafer size—12-inch wafers[1]
Speed—999[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com