Comparison ledger
Applied Materials 0020 17484 Part, Lam Research Gasonics Vector, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0020 17484 PartApplied Materials | Gasonics VectorLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0020 17484 Part | Lam Research Gasonics Vector |
| Specifications | ||
| Configuration | Bar, Cap Bank, Hdpcvd 300mm Ultima X[1] | SiN Oxide[2] |
| User Interface | — | screen & computer[4] |
| Equipment type | — | PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2] |
| Make | — | Lam / Novellus / Gasonics[2] |
| Model | — | Vector[2] |
| Application/material | — | SiN Oxide[2] |
| Vintage | — | 2003[2] |
| Additional configuration | — | 2x FOUP Loadports; Mini-Environment (Front End); Atmospheric Robot; User Interface: screen & computer; Light Tower; 2x Loadlocks; 2x Loadlock Cooling Pedestals; 2x Linear Transfer Modules; 4x Showerheads; Al Heater Pedestals with lift pins (station 1); Al Heater Pedestals (stations 2-4); Pneumatic Spindle; Integrated Liquid Delivery System (not on this particular configuration); Low Frequency RF Generator; High Frequency RF Generator; RF Match; Endpoint Controller; Gas Box; Local Power Box; 3x Super Input / Output Controller; Motion Controller; Module Controller[4] |
| Process | — | PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2] |
| Process material | — | SiN Oxide[2] |
| Configured process | — | UV Cure[3] |
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