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Comparison ledger

0020 17484 PartversusSigma

Applied Materials 0020 17484 Part, SPTS Sigma, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
SigmaSPTS
OEMApplied MaterialsSPTS
CategoryDepositionDeposition
Wafer size—A 1KW lamp for wafer heating
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartSPTS Sigma
Cited variants—
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[2]Beta System[3]
Phase—Power Box (415 VAC, 3 Phase)[3]
Station 1—Vacuum Cassette Handler (VCH)[3]
Station 2—Pre Heat Chambers[3]
Wafer size—A 1KW lamp for wafer heating[3]
Station 3—Aluminum Dep Chamber[3]
Model—Sigma[3]
Make—SPTS / STS[3]
Type—PVD (Physical Vapor Deposition)[3]
System configuration—Beta System[3]
Power box—415 VAC, 3 Phase[3]
Process station 2—Pre Heat Chambers[3]
Wafer heating—A 1KW lamp for wafer heating[3]
Process station 3—Aluminum Dep Chamber[3]
Aluminum target—Al/0.5% Cu[3]
Process station 4—Ti/TiN Dep chamber[3]
Titanium target—Ti 4N5[3]
Process station 5—Soft Sputter Etch chamber[3]
Base pressure—7E-8 Torr[3]
Station 4 RF generator—Advanced energy RFX-600 13.56 MHz RF generator[3]
Station 5 RF generator—Advanced energy RFX-600 A 13.56 MHz RF generator[3]
Station 4—Ti/TiN Dep chamber[3]
Station 5—Soft Sputter Etch chamber[3]
Station 6—Vacuum Cassette Handler (VCH)[3]
Station 3 target—Aluminium target - Al/0.5% Cu[3]
Station 4 target—Titanium target - Ti 4N5[3]
Process type—Physical vapor deposition (PVD)[3]
Power—Power Box (415 VAC, 3 Phase)[4]
Vacuum—Cryo Compressors[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]kla.comkla.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com