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Comparison ledger

0020 17485 PartversusCV-6S

Applied Materials 0020 17485 Part, Temescal CV-6S, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
CV-6STemescal
OEMApplied MaterialsTemescal
CategoryDepositionDeposition
Wafer size—4"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartTemescal CV-6S
Cited variants—
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[2]—
Manufacturer—Temescal[3]
Description—Load Locked Metal Evaporator Dual Gun[3]
Model—CV-6S[3]
Power supply—10 kV[3]
E-beam sources—2 Temescal 4-pocket series 260 e-beam sources[3]
Base pressure—~ 5e-7 ultimate base pressure[3]
Vacuum system—Cryo-pumped system[3]
Load-lock—Present for quick turn-around[3]
Vacuum sequencing—Automatic vacuum sequencing[3]
Beam sweep control—Temescal Super Sweep e-beam sweep control[3]
Thickness monitoring—Inficon IC/5 programmable crystal thickness monitoring system[3]
Sample size—1 wafer up to 4" diameter[3]
Metals, front gun—Ti, Pt, Ni, Au[3]
Metals, rear gun—Pd, Al, Ag, Ge[3]
Power supply type—Constant voltage, 6 kW high frequency switching power supply[1]
Operating capability—Designed to power and control one or two electron beam sources simultaneously[1]
Voltage/current regulation—+/- 0.5%[1]
Included components—Power module, high-voltage/gun control unit, filament transformer, 20 ft. cable set, operator manual[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu