Comparison ledger
Applied Materials 0020 18455 Part, Leybold IBS 1400 HT GT Dual Ion Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0020 18455 PartApplied Materials | IBS 1400 HT GT Dual Ion BeamLeybold |
|---|---|---|
| OEM | Applied Materials | Leybold |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0020 18455 Part | Leybold IBS 1400 HT GT Dual Ion Beam |
| Specifications | ||
| Configuration | Shaft,Rf In Local Match, Hdpcvd,Rev3[1] | 4 position target tower with 3 target positions (optional 4th target)[2] |
| Target tower positions | — | 4 position target tower with 3 target positions (optional 4th target)[2] |
| Sputter source | — | Main KRI sputter source and additional KRI assist source[2] |
| Optical monitor | — | OMS5100i direct optical monitor (as installed in the HELIOS)[2] |
| Substrate carrier | — | 4 x 350mm planetary substrate carrier (2 x 530 mm planets can also be installed)[2] |
| Test glasses | — | Two test glasses (with shutter) on the substrate carrier for complex process monitoring schemes[2] |
| Substrate heater | — | Ceramic plate substrate heater[2] |
| Doors | — | Front and rear doors[2] |
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