Waferpedia

Comparison ledger

0020 18698 PartversusPrecision 5000

Applied Materials 0020 18698 Part, Applied Materials Precision 5000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
Precision 5000Applied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced—1987
Production run—1987–
Lifecycle—Legacy
Lifecycle milestones—1987 Introduction · 1993 Smithsonian collection · 1993 Smithsonian permanent collection induction · 1993 Inducted into Smithsonian collection
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartApplied Materials Precision 5000
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[1]—
Process—Chemical vapor deposition (CVD)[2]
Architecture—Single machine with multiple process chambers; incorporated diverse processes[2]
Introduction Year—1987[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]en.wikipedia.orgen.wikipedia.org