Waferpedia

Comparison ledger

0041-39086 ESC PartversusCentura DPS 2 Poly Dry

Applied Materials 0041-39086 ESC Part, Applied Materials Centura DPS 2 Poly Dry, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Centura DPS 2 Poly DryApplied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Applied Materials Centura DPS
Specifications
Configuration—300mm DPS Metal chamber with 200mm ESC[1]
Mainframe—300mm[1]
Gas—O2, CHF3, Ar, CF4, O2/He, He, N2, HBr, CL2, NF3[1]
OS—Windows NT[1]
Missing—23.11.08 1 LL off line[1]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing