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Applied Materials

Centura DPS 2 Poly Dry

EtchApplied Materials Centura DPS family
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Applied Materials Centura DPS 2 Poly Dry is a 300mm dry etcher. Applied Materials Centura DPS 2 Poly Dry has a DPS metal chamber with 200mm ESC. Applied Materials Centura DPS 2 Poly Dry uses Windows NT.[1][2]

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What it is

The Applied Materials Centura DPS 2 Poly Dry is a semiconductor dry etcher.[1][2]

The Centura DPS 2 Poly Dry uses a 300 mm mainframe and a DPS metal chamber with a 200 mm electrostatic chuck.[1][2]

How it works

The Centura DPS 2 Poly Dry is configured for gas delivery with O2, CHF3, Ar, CF4, O2/He, He, N2, HBr, CL2, and NF3.[1][2]

The Centura DPS 2 Poly Dry uses Windows NT as its operating system.[1][2]

Where it fits in the process flow

The Centura DPS 2 Poly Dry is configured for back-end metal etch.[1][2]

Applications

The Centura DPS 2 Poly Dry is used for poly dry etch applications.[1][2]

The Centura DPS 2 Poly Dry is configured for back-end metal etch.[1][2]

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • 23.11.08 1 LL off line

What do the numbers mean?

Gas & chemistry1

Gas
O2, CHF3, Ar, CF4, O2/He, He, N2, HBr, CL2, NF3[1]
Accurate?

Control & software1

Control system OS
Windows NT[1]
Accurate?

Configuration & options11

300mm DPS Metal chamber with 200mm ESC[2]
Accurate?
Mainframe
300mm[1]
Accurate?
Back end metal etch[1]
Accurate?
OS
Windows NT[1]
Accurate?
Missing
23.11.08 1 LL off line[1]
Accurate?
Manufacturer
Applied Materials[1]
Accurate?
Model
Centura DPS 2[1]
Accurate?
Tool type
Poly Dry Etcher[1]
Accurate?
Back end process
metal etch[1]
Accurate?
Missing note
23.11.08 1 LL off line[1]
Accurate?
Vintage
2001[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • GasO2, CHF3, Ar, CF4, O2/He, He, N2, HBr, CL2, NF3[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the Centura DPS 2 Poly Dry?

The Centura DPS 2 Poly Dry is a semiconductor dry etcher.[1][2]

What chamber and chuck configuration does the Centura DPS 2 Poly Dry use?

The Centura DPS 2 Poly Dry uses a DPS metal chamber with a 200 mm electrostatic chuck.[1][2]

Not publicly documented

The following facts about the Centura DPS 2 Poly Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura DPS 2 Poly Dry are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Centura DPS 2 Poly Dry are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Centura DPS 2 Poly Dry are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the Centura DPS 2 Poly Dry is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Centura DPS 2 Poly Dry are on record.

    Answerable by: an OEM parts catalog or a service engineer

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
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Last updated Oct 13, 2026.

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