Waferpedia

Comparison ledger

0041-39086 ESC Partversus590

Applied Materials 0041-39086 ESC Part, Lam Research 590, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
590Lam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Lam Research 590
Specifications
Voltage—208V[1]
Wafer size—6 inch[1]
RF frequency—13.56 MHz[3]
Pressure—2.8 Torr[3]
Gap—0.38 cm[3]
Power (low)—450 W[3]
Power (high)—850 W[3]
OEM—Lam Research[1]
Model—590[1]
Category—Etcher[1]
Power—208V[1]
Plasma recipe entry—CF4+CHF3+He (90:30:120 sccm)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]nanocenter.umd.edunanocenter.umd.edu