Applied Materials
Centura DPS 2 AE Minos Poly alternatives
Comparable semiconductor equipment documented in the Waferpedia catalog.
6 comparable tools
Tri
-Mist 850 Electronic Air Filter
KLA
.498 PSL Wafer
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
Applied Materials
0010 47763
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-03254 E Chuck
Applied Materials
0010-03485 Magnet Assy
Applied Materials
0010-13627 High Efficiency RF Match
The Applied Materials 0010-13627 is a high efficiency RF match designed for semiconductor equipment.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare Centura DPS 2 AE Minos Poly with another model →