Comparison ledger
Applied Materials VIISta Plad High Current, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta Plad High CurrentApplied Materials | 160 XPVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISTA | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Chamber only[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Category | Ion Implantation[2] | — |
| Tool type | High current ion implanter[2] | — |
| Wafer size | 12-inch[2] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →