Applied Materials
VIISta Plad High Current
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Applied Materials VIISta Plad High Current is a high current ion implanter used for ion implantation.[1]
The Applied Materials VIISta Plad High Current is configured for 12-inch wafers.[1]
How it works
General reference — not yet source-verifiedAn ion implanter forms a beam of charged dopant ions and drives that beam into a semiconductor wafer to change the wafer's electrical properties.
A high current implanter is used when the process calls for substantial ion dose delivery across production wafers.
Where it fits in the process flow
General reference — not yet source-verifiedThe Applied Materials VIISta Plad High Current belongs in the wafer doping portion of front-end semiconductor fabrication.
Ion implantation generally follows lithography and masking steps that define where dopants enter the wafer, and it is followed by thermal processing that activates or redistributes the implanted dopants.
Applications
The Applied Materials VIISta Plad High Current is used for ion implantation on semiconductor wafers.[1]
What do the numbers mean?
Wafer handling1
Configuration & options4
- Chamber only[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian Viision 200— Same function class: Ion Implantation, nullCompare in depthsource[2]
- Axcelis GSD 200 E 2 High Current— Same function class: Ion Implantation, nullCompare in depthsource[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of machine is the Applied Materials VIISta Plad High Current?
The Applied Materials VIISta Plad High Current is a high current ion implanter for ion implantation.[1]
Not publicly documented
The following facts about the VIISta Plad High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta Plad High Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta Plad High Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta Plad High Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta Plad High Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta Plad High Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Equipment inventory listing
Last updated Oct 13, 2026.
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The Axcelis GSD 200 E 2 is a high current implanter with source-stated wafer sizes of 6 inch and 8 inch.
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
