Comparison ledger
ASML PAS 5000 55 A, CEE 100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 5000 55 AASML | 100CEE |
|---|---|---|
| OEM | ASML | CEE |
| Category | Lithography | Lithography |
| Wafer size | Wafer Tilt Monitor | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5000 55 A | CEE 100 |
| Cited variants | — |
|
| Specifications | ||
| Software Version | 8.1.0[2] | — |
| Configuration | Includes Option File:[2] | — |
| Wafer size | Wafer Tilt Monitor[3] | Up to 6 inches[4] |
| Manufacturer | ASML[2] | — |
| Model | PAS 5000 / 55 A[2] | — |
| Equipment type | Stepper[3] | Spin coater[5] |
| Category | Lithography[3] | — |
| Includes Option File | PEP 2 (Color Graphics); PEP 1/3/4; Extended Filesystem (MEP); Reticle Error Correction; Throughput Enhancement; Batch Status Light; 88 um Error Detection; Chuckspot Detection; Wafer Tilt Monitor[2] | — |
| Tool type | — | Spray Developer[1] |
| Accepts wafer size | — | up to 6" wafers[4] |
| Programmable programs | — | 10 programs[4] |
| Steps per program | — | up to 10 steps[4] |
| Programmable step parameters | — | Acceleration, Speed, Time[4] |
| Associated document | — | CEE Model 100CB Spinner.doc[4] |
| Programs | — | 10 programs each with up to 10 steps[4] |
| Control parameters | — | Acceleration, Speed, Time[4] |
| Programming | — | 10 programs; up to 10 steps per program[4] |
| Step parameters | — | Acceleration, speed, time[4] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →