100

The CEE 100 is a spin coater used in photolithography. Spin coaters apply liquid photoresist or other coating fluids to a substrate by rotating the substrate so the liquid spreads into a thin film. Spin coaters are typically used in the coating stage before soft bake, alignment or exposure, development, and later pattern transfer steps.

The Cee Model 100 and 150 spinner module incorporates a stainless steel spin bowl. The spin bowl drain and exhaust connect through Teflon tubing to the main utilities bracket on the rear of the machine. The main drive spindle for the spin chuck is made of hardened corrosion-resistant alloy steel. The spindle is driven by a toothed belt and a servo motor. An integral optical encoder provides feedback for the closed-loop digital motor control system. The Cee Model 100 and 150 use a closed bowl design with an exhaust lid and a bottom exhaust port beneath the spin chuck.^[4]

Spin coating sits in the lithography sequence after substrate preparation and before exposure and development. A typical flow places adhesion promotion or dehydration before coating, then uses bake steps to condition the film, followed by patterning and resist development. The coated resist can then serve as a temporary imaging layer for etch, deposition, implantation, or lift-off steps.

Spin coaters are used to form uniform thin liquid films for photolithography and related microfabrication work. Common uses include coating positive or negative photoresists, lift-off stacks, and other solution-processed layers that must be spread evenly before later thermal or patterning steps.