Comparison ledger
Axcelis 200 ACU, Oxford Instruments 80-etch, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | 80-etchOxford Instruments |
|---|---|---|
| OEM | Axcelis | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Oxford Instruments 80-etch |
| Specifications | ||
| Configuration | Parts Machine[1] | — |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | 80-etch[5] |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | 9M69591A[5] |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| OEM | — | Oxford Instruments[5] |
| S/N | — | 9M69591A[5] |
| Controller arrangement | — | One controller for both RIE and PECVD[5] |
| PECVD capabilities | — | Amorphous Si, Si3N4, SiONx, SiO2[5] |
| Source gases available | — | SiH4, N2, N2O, NH3, Ar[5] |
| Category | — | Etch[6] |
| Process use | — | Wafer or thin film etching/patterning[5] |
| Source gases | — | SiH4, N2, N2O, NH3, Ar[5] |
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