Waferpedia

Comparison ledger

NV GSD A 80versus160 XP

Axcelis NV GSD A 80, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
160 XPVarian
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD A 80Varian 160 XP
Cited variants—
Specifications
Phase3 Phase[2]—
Power30 KVA[2]—
Voltage200 V[3]—
Frequency50 Hz[3]—
GasBF3, ASH3, AR[2]—
ConfigurationPumps:[2]—
P1Turbo Pump Mitsubishi PT 1500[2]—
P2Cyro Pump Suzuki-Syokan A200[2]—
P3Cryo Pump Suzuki-Syokan A300[2]—
RP1Dry Pump Ebara A07V[2]—
RP2Dry Pump Ebara A30V[2]—
RP3Alcatel Drytel34[2]—
ManufacturerAxcelis[2]—
ModelNV GSD A 80[2]—
Equipment typeIon implanter[4]—
Wafer size8 inch[2]—
Power rating30 KVA[2]—
Gas deliveryBF3, ASH3, AR[2]—
Pump P1Turbo Pump Mitsubishi PT 1500[2]—
Pump P2Cyro Pump Suzuki-Syokan A200[2]—
Pump P3Cryo Pump Suzuki-Syokan A300[2]—
Pump RP1Dry Pump Ebara A07V[2]—
Pump RP2Dry Pump Ebara A30V[2]—
Pump RP3Alcatel Drytel34[2]—
Configuration (160 XP Ion variant)—150mm High Current IMP[1]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]waferpedia.comwaferpedia.com