Axcelis
NV GSD A 80
What it is
The Axcelis NV GSD A 80 is an ion implanter.[4]
How it works
The Axcelis NV GSD A 80 is configured with three-phase power, a power rating of 30 KVA, 200 V supply, and 50 Hz frequency.[1][3]
The Axcelis NV GSD A 80 uses BF3, ASH3, and AR gas delivery and includes vacuum pumping elements named P1 Turbo Pump Mitsubishi PT 1500, P2 Cryo Pump Suzuki-Syokan A200, P3 Cryo Pump Suzuki-Syokan A300, RP1 Dry Pump Ebara A07V, RP2 Dry Pump Ebara A30V, and RP3 Alcatel Drytel34.[1][3]
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a front-end semiconductor process step that follows wafer preparation and precedes later thermal and patterning steps used to activate or shape the implanted region.
Applications
General reference — not yet source-verifiedIon implanters are used to form or adjust doped regions for device structures that require controlled carrier concentration and junction depth.
What do the numbers mean?
Power & electrical8
Vacuum & pumping8
- Pumps:[1]
Wafer handling1
Gas & chemistry2
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Phase3 Phase[1]
- Voltage200 V[3]
- Frequency50 Hz[3]
- GasBF3, ASH3, AR[1]
- ConfigurationPumps:[1]
- P1Turbo Pump Mitsubishi PT 1500[1]
- P2Cyro Pump Suzuki-Syokan A200[1]
- P3Cryo Pump Suzuki-Syokan A300[1]
- RP1Dry Pump Ebara A07V[1]
- RP2Dry Pump Ebara A30V[1]
- Power3 phase[3]
- Gas deliveryBF3, ASH3, AR[1]
- Pump P1Turbo Pump Mitsubishi PT 1500[1]
- Pump P2Cyro Pump Suzuki-Syokan A200[1]
- Pump P3Cryo Pump Suzuki-Syokan A300[1]
- Pump RP1Dry Pump Ebara A07V[1]
- Pump RP2Dry Pump Ebara A30V[1]
- Pump RP3Alcatel Drytel34[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the NV GSD A 80 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV GSD A 80 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV GSD A 80 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV GSD A 80 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV GSD A 80 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV GSD A 80 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 13, 2026.
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