Comparison ledger
Brooks 017-0024-01 Prealigner, Nikon i 12 D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | i 12 DNikon |
|---|---|---|
| OEM | Brooks | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | Wafer Equipment |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | Nikon i 12 D |
| Cited variants | — |
|
| Specifications | ||
| Version | — | 150 mm[2] |
| Resolution | — | 0.35μm or less (High resolution, positive resist film of 1.0μm thickness )[2] |
| Configuration | — | Focus Calibration Repeatability:[2] |
| Measurement of Initial Heat | — | 180 min[2] |
| Measurement of Initial Cool | — | 240 min[2] |
| Reticle Blind Setting Accuracy | — | + 0.4 to + 0.8 mm (on reticle)[2] |
| Wafer size | — | Wafer Equipment[3] |
| Machine type | — | Stepper[2] |
| Focus calibration repeatability | — | Within 100 nm (3σ), 20 measurements[2] |
| Lens distortion including magnification error | — | Within ±40 nm, 37 points/chip[2] |
| Magnification control | — | Within ±15 nm[2] |
| Maximum exposure area | — | Within 31.11 mm diameter; 22.0 mm x 22.0 mm to 17.96 mm x 25.2 mm (hor.) x (vert.)[2] |
| Exposure power | — | 800 mW/cm2 or more[2] |
| Integrated exposure stability | — | Within ±1.0% (50 mJ/cm2 or more); within ±0.5% (at 100 mJ/cm2)[2] |
| Illumination uniformity | — | Within ±1.0%[2] |
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