Nikon
i 12 D
The Nikon i 12 D is a stepper. The Nikon i 12 D is a 150 mm version. The Nikon i 12 D is specified for 0.35 μm or less resolution.[1][2]
Wafer size
Wafer Equipment
Performance
Focus Calibration Repeatability:[1]
Optics
Within 100 nm ((3σ) )[1]
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedSteppers such as the i 12 D are used in the photolithography step of semiconductor manufacturing, where the circuit pattern is transferred from the reticle to the wafer.
Applications
What do the numbers mean?
Wafer handling1
Gas & chemistry1
Optics & imaging19
- Within 100 nm ((3σ) )[1]
- Lens Distortion (Including Magnification Error):[1]
- Within ± 40 nm 37 points / chip[1]
- Magnification Control:[1]
- Within ± 15 nm[1]
- Maximum Exposure Area:[1]
- Exposure Power:[1]
- Integrated Exposure Stability (including integrated exposure matching):[1]
- Within 100 nm (3σ)[2]
- Lens Distortion (Including Magnification Error): - Within ± 40 nm 37 points / chip[2]
- Maximum exposure area
- Within 31.11 mm diameter; 22.0 mm x 22.0 mm to 17.96 mm x 25.2 mm (hor.) x (vert.)[1]
- Integrated exposure stability
- Within ±1.0% (50 mJ/cm2 or more); within ±0.5% (at 100 mJ/cm2)[1]
Performance1
- Focus Calibration Repeatability:[1]
Configuration & options11
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Nikon i 12 D | — | — | One source describes a 150 mm version with 0.35 μm or less resolution; another source describes the same model with the same core specifications and a 2001 vintage note. | Equipment inventory listing[2] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Resolution0.35μm or less (High resolution, positive resist film of 1.0μm thickness )[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Why is alignment important in this class of machine?General reference — not yet source-verified
Each patterned layer must register correctly to features already present on the substrate. Alignment controls overlay between layers and helps ensure the intended device geometry is formed.
Does the lithography tool itself etch or deposit material?General reference — not yet source-verified
No. Machines of this class create the resist pattern. Separate tools then use that pattern to etch, implant, plate, or deposit material in the required areas.
What determines the quality of the printed pattern?General reference — not yet source-verified
Pattern quality depends on the interaction of resist processing, mask or reticle imaging, optical performance, focus, exposure control, alignment, and substrate condition.
Not publicly documented
The following facts about the i 12 D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the i 12 D are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the i 12 D are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the i 12 D are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the i 12 D is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the i 12 D are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]dealer listingwotol.com
Last updated Oct 15, 2026.
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