Waferpedia

Comparison ledger

BedeMetrix F FT-NIR versus contour-R1

Bruker BedeMetrix F FT-NIR and Bruker contour-R1, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
OEMBrukerBruker
CategoryPrecision OpticsPrecision Optics
Wafer size
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyBruker BedeMetrix F FT-NIRBruker contour-R1
Specifications
SoftwareMS Windows XP Prof v. 5.1.2600[1]Vision64 for automation and analysis[3]
ProcessXRD[1]
Factory InterfaceFOUP (2)[1]
ConfigurationRobot Handler[1]
Equipment typeOptical Profiler[2]
Equipment identifierInert-BRUKER-contour-R1[2]
Measurement principleOptical (non-contact) 3D surface characterization; uses interference microscopy[3]
Vertical resolution (VSI mode)~3 nm[3]
Vertical resolution (PSI mode)<0.1 nm[3]
Max. sample height100 mm[3]
Max. sample diameter150 mm[3]
Max. single measurement area1.0 mm x 1.0 mm (with stitching for larger areas)[3]
Measurement modesVertical Scanning Interferometry (VSI) and Phase Shifting Interferometry (PSI)[3]
Objectives10X and 50X on a software controlled motorized turret[3]
Field of view (FOV) lens0.55X and 2X[3]
Stage typeMotorized X-Y stage[3]
Additional capabilitiesStitching algorithm for combining multiple images; handles rough surfaces, abrupt steps, slopes >60°, and low reflectance <0.5%[3]

Plan your fab

Building a Precision Optics process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]uwaterloo.cauwaterloo.ca
  3. [3]uwaterloo.cauwaterloo.ca