Comparison ledger
Canon Anelva ILD 4100 SR Dry, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | |
|---|---|---|
| OEM | Canon | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon Anelva | Oxford Instruments 100 ICP Fluorine |
| Cited variants |
| — |
| Specifications | ||
| Configuration | Oxide[2] | — |
| Manufacturer | Canon Anelva[1] | — |
| Model | ILD 4100 SR[1] | — |
| Equipment type | Dry Etcher[3] | — |
| Wafer size | 8 inch[1] | 4 inch, 6 inch, 8 inch (with clamp change)[4] |
| Vintage | 1996[3] | — |
| Process | Oxide[2] | — |
| Tool type | Dry Etcher[1] | — |
| Wafer sizes | 8 inch[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[4] |
| Cryo DRIE etch rate | — | up to 5 µm/min[4] |
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