Comparison ledger
Canon FPA 2500 i 3, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 2500 i 3Canon | 1505 G 6 ENikon |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 2500 | Nikon 1505 |
| Specifications | ||
| Configuration | Some problems of alignment repeatability not stable (can be fixed by FSE)[1] | 5" reticle[4] |
| Manufacturer | Canon[1] | — |
| Model | FPA 2500 i 3[1] | 1505 G 6 E[4] |
| Equipment type | Stepper[2] | — |
| Category | Lithography[2] | Stepper[4] |
| Wafer size | 8 inch[1] | — |
| Reticle size | 5 inch[3] | — |
| Manufacture year | 1993[3] | — |
| Wafer type | Notch[3] | — |
| Chuck type | Ring[3] | — |
| Auto feed | Left hand[3] | — |
| Track interface | Yes[3] | — |
| Software version | VS 5.26 BW[3] | — |
| Performance metric | IUC Uniformity NA/Sigma mode (54/60) 517[3] | — |
| Known issue | Some problems of alignment repeatability not stable (can be fixed by FSE)[2] | — |
| Resolution | — | 650 nm[5] |
| Numerical Aperture | — | 0.54[5] |
| Reduction | — | 5x[5] |
| Exposure Field | — | 15 x 15 mm[5] |
| Alignment Accuracy | — | 130 nm[5] |
| Wafer Size | — | 4 inch[4] |
| Light Source | — | g-line[6] |
| Introduction Year | — | 1988[5] |
| NA (Numerical Aperture) | — | 0.54[5] |
| Make | — | Nikon[4] |
| Wafer Sizes | — | 4 inch[4] |
| Exposure type | — | g-line[5] |
| NA | — | 0.54[5] |
| Exposure field | — | 9.3 x 18.8 mm[5] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →