Comparison ledger
Canon FPA 2500 i 3, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 2500 i 3Canon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 2500 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Some problems of alignment repeatability not stable (can be fixed by FSE)[1] | — |
| Manufacturer | Canon[1] | — |
| Model | FPA 2500 i 3[1] | — |
| Equipment type | Stepper[2] | — |
| Category | Lithography[2] | — |
| Wafer size | 8 inch[1] | — |
| Reticle size | 5 inch[3] | — |
| Manufacture year | 1993[3] | — |
| Wafer type | Notch[3] | — |
| Chuck type | Ring[3] | — |
| Auto feed | Left hand[3] | — |
| Track interface | Yes[3] | — |
| Software version | VS 5.26 BW[3] | — |
| Performance metric | IUC Uniformity NA/Sigma mode (54/60) 517[3] | — |
| Known issue | Some problems of alignment repeatability not stable (can be fixed by FSE)[2] | — |
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