Comparison ledger
Canon FPA 3000 i 4, SUSS MicroTec MA 6 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 3000 i 4Canon | MA 6 MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 3000 | SUSS MicroTec MA 6 Mask |
| Cited variants |
| — |
| Specifications | ||
| Configuration | Intensity 6530 ( W/m2 ) LPA – 0.846[3] | 1000 Watt Power Supply[7] |
| Manufacturer | Canon[3] | — |
| Model | FPA 3000 i 4[3] | MA 6[10] |
| Wafer size | 6 inch[3] | — |
| Type | Fine Pattern Aligner[2] | — |
| Software version | V4.09A.08[2] | — |
| Reticle size | 6" square t=0.25"[4] | — |
| Reticle material | Quartz[4] | — |
| Pattern material | 2 layer Cr, 3 layer Cr[4] | — |
| Pellicle frame | Pattern Side Only[4] | — |
| Wafer sizes | 4" thru 8" SEMI Standard, JEIDA, Notch / Flat[4] | — |
| Projection magnification | 1/5 X[4] | — |
| Numerical aperture | .45 - .63[4] | — |
| Field size | 22x22 17x26[4] | — |
| Exposure light | Kr F(365nm)[4] | — |
| Light source | 2.0KW Super High Pressure Hg Lamp[4] | — |
| Intensity | 6500 W/m2[4] | — |
| Uniformity | 1.0[5] | — |
| Resolution | <0.35μm[4] | 1 Micron on 6 inch wafers[7] |
| Depth of focus | >.8μm[4] | — |
| Image field deviation | <.5μm[4] | — |
| Distortion | <±0.05μm[4] | — |
| Reticle rotation accuracy | <±0.01μm on wafer[4] | — |
| Reticle rotation repeatability | <0.02μm) on wafer[4] | — |
| Wafer alignment | <0.06μm mean + 3sigma[4] | — |
| Focus repeatability | <0.10μm (3sigma)[4] | — |
| Leveling repeatability | <7ppm (3sigma)[4] | — |
| Minimum compensation range | >100ppm[4] | — |
| Step accuracy | <0.04μm (3sigma)[4] | — |
| Scaling | <±0.5ppm[4] | — |
| Orthogonality | <±0.5ppm[4] | — |
| Throughput | >83 wafers/hour Φ6", 22mm, 32 shots[4] | — |
| Model year | 1998[5] | — |
| Serial number | 605669[5] | — |
| Illumination source | 365[5] | — |
| Projection ratio | 5:1[5] | — |
| Field | 22 x 22[5] | — |
| Alignment accuracy | 60[5] | — |
| Stage type | ABS[5] | — |
| Voltage | — | 230 V[8] |
| UV lamp power supply | — | CIC1200/157308LS[9] |
| Wafer Sizes | — | 2, 3, 4, 5, 6, 12 inch[8] |
| Power Supply | — | 1000 Watt[7] |
| Illumination | — | IR Back Side Illumination[7] |
| Microscope | — | Split Field Microscope with 6 Objectives[7] |
| Alignment | — | Infrared Alignment[8] |
| Topside Alignment Objectives | — | MplanFL N 5x/0.15, MplanFL N 10x/0.30, LMPlanFL N 20x/0.40[9] |
| Air Chuck | — | 7-inch[9] |
| Voltage / Frequency | — | 200-240V, 50/60Hz[9] |
| Make | — | SUSS[10] |
| Product Details | — | up to 6" - 50/60 Hz - 230 V - HDD - Software - with Infrared Alignment - No BSA 2001 Vintage[8] |
| Power supply | — | 1000 Watt Power Supply[7] |
| Frequency | — | 50/60Hz[9] |
| Air chuck | — | 7-inch air chuck[9] |
| Vintage | — | 2008[9] |
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