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Comparison ledger

100 SpinversusGasonics Gamma 2130 Photoresist Stripper

CEE 100 Spin, Lam Research Gasonics Gamma 2130 Photoresist Stripper, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEELam Research
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 100Lam Research Gasonics
Specifications
ConfigurationVolts 115[1]System Configuration:[2]
Load Port—Brooks Fixload TM V6[2]
EFEM Robot—02-169208-00[2]
Aligner—Yaskawa[2]
RF Rack—Generator ENI GHW-50A-04 5ea[2]
Light Curtain—Keyence[2]
EPD—4ea(#2,#3,#4,#5 Port)[2]
RF Matcher—CPMX-3000 5ea[2]
RF Source—02-352103-00 5ea[2]
HDIS Pedestal—#2, #3, #,1, #6[2]
Fixed Pedestal—#4, #5[2]
Stage #1—Preheat[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing