Lam Research
Gasonics Gamma 2130 Photoresist Stripper
What it is
General reference — not yet source-verifiedA photoresist stripper removes patterned resist and related organic films after a lithography-driven pattern transfer step has been completed. Resist processing tools of this class are used to prepare wafers for subsequent cleaning, inspection, deposition, or another patterning sequence.
How it works
General reference — not yet source-verifiedPhotoresist strippers in this class generally remove resist by exposing the wafer to reactive process chemistry in a controlled chamber environment. Chamber hardware in this class typically combines wafer handling, temperature conditioning, gas delivery, pressure control, and plasma or downstream activation hardware to break down organic films for removal.
Where it fits in the process flow
General reference — not yet source-verifiedPhotoresist stripping is normally performed after a lithography pattern has already served its role in etch, implant, or deposition patterning. Resist stripping is a post-patterning step that commonly precedes final clean, metrology, inspection, dielectric formation, metallization, or another lithography cycle.
Applications
General reference — not yet source-verifiedPhotoresist strippers are used to remove photoresist and related organic residues from semiconductor wafers. Tools in this class are also applied where plasma-activated or chemically assisted removal is needed after pattern transfer and before the next fabrication module.
What do the numbers mean?
Power & electrical6
Vacuum & pumping2
Wafer handling1
Gas & chemistry7
Control & software2
Configuration & options19
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- RF RackGenerator ENI GHW-50A-04 5ea[1]
- ConfigurationSignal Cable (RF Cable Included)Process Chamber Configuration:[1]
- RF MatcherCPMX-3000 5ea[1]
- RF Source02-352103-00 5ea[1]
- ConfigurationSignal Cable (RF Cable Included) Process Chamber Configuration:[2]
- Equipment typePhotoresist Stripper[1]
- CategoryResist Processing[3]
- RF rack generatorENI GHW-50A-04, 5ea[1]
- ManometerMKS 10 Torr[1]
- Gas box MFC #1Brooks O2[1]
- Gas box MFC #2Brooks N2[1]
- Gas box MFC #3Brooks H2N2[1]
- Gas box MFC #4Brooks CF4[1]
- ManometorMKS 10 Torr[1]
- Gas BoxMFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Gasonics Gamma 2130 Photoresist Stripper are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics Gamma 2130 Photoresist Stripper are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics Gamma 2130 Photoresist Stripper are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics Gamma 2130 Photoresist Stripper are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics Gamma 2130 Photoresist Stripper are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gasonics Gamma 2130 Photoresist Stripper is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 17, 2026.
Compare with similar tools
View all →
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.
