Comparison ledger
CEE 100, RECIF SPP 300 Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | SPP 300 WaferRECIF |
|---|---|---|
| OEM | CEE | RECIF |
| Category | Lithography | Lithography |
| Wafer size | 6" | Front & Backside Wafer ID Reader (RFID) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | RECIF SPP 300 Wafer |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Front & Backside Wafer ID Reader (RFID)[3] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Configuration | — | 300 mm (12") FOUP Load Port[3] |
| Servicing Port | — | M / F Rear (Can Add 3rd LP Here)[3] |
| Status Lamp (Front & Rear) | — | Programmable[3] |
| Turn to Release EMO | — | Load Ports, M / F Rear[3] |
| Vacuum (House) | — | Optional Depending on LPS Used[3] |
| Power | — | 110 VAC, 15 A, 3 Wire, 1 Phase, Freq 60 Hz[3] |
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