Waferpedia

Comparison ledger

1000 Hot PlateversusLSA101

CEE 1000 Hot Plate, Veeco LSA101, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
LSA101Veeco
OEMCEEVeeco
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced—2021
Production run——
Lifecycle——
Lifecycle milestones—2021 First shipment
Control system——
Generation——
FamilyCEE 1000 Hot PlateVeeco LSA101
Specifications
Configuration4"[1]—
TypeHot Plate[1]—
Wafer Size4 inch[1]—
System type—Laser Spike Annealing System[2]
Process application—Precision doping of materials at a controlled temperature[2]
Origination facility—San Jose, California[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]en.wikipedia.orgen.wikipedia.org