Comparison ledger
CEE 200 Spin, Tokyo Electron Act 8, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | Act 8Tokyo Electron |
|---|---|---|
| OEM | CEE | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | Tokyo Electron Act |
| Cited variants | — |
|
| Specifications | ||
| Phase | 1 Phase[4] | — |
| Type | Spin Coater[4] | — |
| Model | 200[4] | — |
| Make | CEE[4] | — |
| Wafer Sizes | 8 inch[4] | — |
| Configuration | 1 Phase[4] | Dual Block, 4 Load Port/1 Side Port[1] |
| Equipment type | Spin Coater[4] | — |
| Spin speed | 5000 rpm[5] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[5] | — |
| Substrate thickness max | 12 mm[5] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[5] | — |
| Vintage | — | 2006 |
| Coaters & Developers Vintage | — | 1999 |
| Wafer Size | — | 8 inch[8] |
| Known issues | — | Not included: T&H |
| Process | — | COAT / DEV |
| Software Version | — | 1.18.002 |
| CIM | — | SECS OEM Model Description |
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