Waferpedia

Comparison ledger

120 Automated Coater ProcessingversusSK 80 BW-AVPE

EV Group 120 Automated Coater Processing, SCREEN SK 80 BW-AVPE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
OEMEV GroupSCREEN
CategoryResist ProcessingResist Processing
Wafer size—Wafer Transfer Robot x 1 (1 Block System)
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 120 Automated Coater ProcessingSCREEN SK 80
Specifications
Configuration50/60 Hz[1]4 Cassette Loading Port[2]
Phase3 Phase[1]—
Wafer sizes6 inch, 8 inch[1]—
Frequency50/60 Hz[1]—
Wiring configuration4 Wire + GND[1]—
Vintage2015[1]1995[2]
Process—Photo[2]
Cassette Index Station—4 Side Loading[2]
Wafer size—Wafer Transfer Robot x 1 (1 Block System)[2]
PR Resist Pump—Iwaki Bellows Pump 4 Set Per 1 Spin Unit[2]
Wafer Flow Direction—Right to Left[2]
Voltage—100V, 3.5 kW[3]
Main Body—CCD, ETU, TCU, Power Unit (USA)[3]
OEM—SCREEN / DNS[2]
Model—SK 80 BW-AVPE[2]
Equipment type—Coater / Developer[2]
Cassette loading port—4 cassette loading port[2]
Layout—2 coater & 2 developer layout[2]
Wafer transfer—Wafer Transfer Robot x 1 (1 Block System)[2]
Main body components—CCD, ETU, TCU, Power (USA)[2]
Power—100V, 3.5 kW; 208V, 9.4 kW; 208V, 8.4 kW[3]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing