Comparison ledger
EV Group 120 Automated Coater Processing, SUSS MicroTec Falcon ACS 200 Coater Developer Cluster, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 120 Automated Coater ProcessingEV Group | Falcon ACS 200 Coater Developer ClusterSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 120 Automated Coater Processing | SUSS MicroTec Falcon |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 50/60 Hz[2] | Developer (4)[1] |
| Phase | 3 Phase[2] | — |
| Wafer sizes | 6 inch, 8 inch[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Wiring configuration | 4 Wire + GND[2] | — |
| Vintage | 2015[2] | — |
| Wafer Sizes | — | 4, 5, 6, 8 inch[3] |
| Configuration (Asset #142142) | — | Developer (4) 2000 Vintage[1] |
| Configuration (Asset #142141) | — | Coater (3) 2000 Vintage[3] |
| OEM | — | SUSS[1] |
| Model | — | Falcon ACS 200[4] |
| Equipment type | — | Coater / Developer Cluster System[4] |
| Category | — | Resist Processing[4] |
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