SUSS MicroTec
Falcon ACS 200 Coater Developer Cluster
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS Falcon ACS 200 is a coater/developer cluster system. The SUSS Falcon ACS 200 processes wafers in sizes 4, 5, 6, and 8 inches.[1][2]
What it is
How it works
General reference — not yet source-verifiedCoater and developer cluster systems automate photoresist processing by moving wafers between enclosed process modules. Coater modules generally dispense liquid resist onto a rotating wafer to form a uniform film. Developer modules generally apply developer chemistry after exposure to remove the intended portion of the resist pattern. Cluster architecture is used to link these steps under automated wafer handling and controlled process sequencing.
Where it fits in the process flow
General reference — not yet source-verifiedResist processing tools sit in the lithography flow around the patterning step. Coating is performed before exposure so the wafer carries a uniform photoresist film. Development is performed after exposure so the latent image becomes a patterned resist mask for later transfer or lift-off. Coater and developer cluster systems are used alongside bake, chill, and wafer transport functions to maintain consistent lithography preparation and pattern reveal.
Applications
General reference — not yet source-verifiedCoater and developer cluster systems are used wherever photolithographic resist films must be applied and then developed. Typical uses include patterning for etch masking, lift-off pattern definition, implant masking, and other microfabrication flows that depend on photoresist imaging. Such tools are also used in research and pilot-line environments where repeatable resist coating and development are needed across multiple wafer formats.
What do the numbers mean?
Wafer handling1
Gas & chemistry4
- Developer (4)[1]
Configuration & options5
- Coater (3)[2]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Falcon ACS 200 | — | 2000–2000 | Listed as a coater configuration in one source and a developer configuration in another source. | Equipment inventory listing[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Falcon ACS 200 Coater Developer Cluster are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Falcon ACS 200 Coater Developer Cluster are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Falcon ACS 200 Coater Developer Cluster are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Falcon ACS 200 Coater Developer Cluster are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Falcon ACS 200 Coater Developer Cluster is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Falcon ACS 200 Coater Developer Cluster are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]inventory listing
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 20, 2026.
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