Waferpedia

Comparison ledger

301 Cleaningversus1000FP

EV Group 301 Cleaning, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
301 CleaningEV Group
OEMEV GroupYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeManual wafer loading—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 301 CleaningYES 1000FP
Specifications
Configurationwith camera for bond void inspection[1]—
Wafer sizeManual wafer loading[2]—
CategoryWet Processing / Clean[3]—
OpticsCamera for bond void inspection[1]—
ApplicationSOI, MEMS and compound semiconductor bonding[1]—
Vintage2011[1]—
System type—Plasma cleaning system[4]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[4]
Model—Glen/YES 1000FP[4]
Designed use—Designed to accept a range of shelf sizes[4]
Application focus—Changing needs of the flat panel industry[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]web.archive.orgweb.archive.org