Waferpedia

Comparison ledger

F10-RT-UVX versus F50

Filmetrics F10-RT-UVX and Filmetrics F50, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
F10-RT-UVXFilmetrics
F50Filmetrics
OEMFilmetricsFilmetrics
CategoryMetrology & InspectionMetrology & Inspection
Wafer size150mm
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyFilmetrics F10-RT-UVXFilmetrics F50
Cited variants
Specifications
FunctionReflection/Transmission Spectra & Optical Film Thickness[2]
ModelF10-RT-UVX[2]F50-UV[3]
OEMFilmetrics[2]
ManufacturerFilmetrics[3]
Tool TypeInspection, Test and Characterization[3]
DescriptionThin-Film Reflectometry[3]
Reflection spectrum range190-1100 nm[3]
Light sourcesDeuterium (UV) and Halogen (Vis-nIR)[3]
Thickness / optical constants range10 Å to 150 µm thickness, n, and k measurements[3]
Wafer mapping sizeMotorized mapping on wafers up to 150 mm[3]
Small substrate size≥ 2-3 mm[3]
Measurement spot sizeApprox. 1-2 mm[3]
Measurement capabilityCan model up to three layers with accuracy[3]
Measurement modesMotorized wafer-mapping or non-motorized single-spot measurements[3]
Maximum sample sizeSamples as large as 300 mm in diameter[1]
Stage typeMotorized R-Theta stage[1]
Mapping speedAs quickly as two points per second[1]
Computer interfaceUSB port connection to a Windows computer[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  3. [3]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu