Waferpedia

Comparison ledger

F10-RT-UVX versus F50-UV

Filmetrics F10-RT-UVX and Filmetrics F50-UV, side by side. Every value shown is drawn from its cited encyclopedia entry.

Side-by-side comparison of selected equipment models
Attribute
F10-RT-UVXFilmetrics
F50-UVFilmetrics
OEMFilmetricsFilmetrics
CategoryMetrology & InspectionMetrology & Inspection
Wafer size8"
Process node
Introduced
Production run
Lifecycle
Lifecycle milestones
Control system
Generation
FamilyFilmetrics F10-RT-UVXFilmetrics F50-UV
Specifications
FunctionReflection/Transmission Spectra & Optical Film Thickness[1]thin-film thickness and optical characteristics measurement[2]
ModelF10-RT-UVX[1]Filmetrics F50-UV[2]
OEMFilmetrics[1]
VendorFilmetrics[2]
Measurement methodspectroscopic reflectometry[3]
Automated stageyes[2]
Sample sizeup to 8 inches in diameter[2]
Substrate size~5 mm × 5 mm to 200 mm diameter[3]
Thickness measurement range5 nm – 40 µm[3]
Minimum thickness to measure n and k50 nm[3]
Wavelength range190–1100 nm[3]
Spot size1.5 mm[3]
Light sourcedeuterium + tungsten-halogen (dual light source; may choose one or both lamps)[3]
Measurement results visualization2D and 3D[3]

Plan your fab

Building a Metrology & Inspection process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  2. [2]uwaterloo.cauwaterloo.ca
  3. [3]confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca