Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, SCREEN SK 80 BW-AVPE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SK 80 BW-AVPESCREEN | |
|---|---|---|
| OEM | Headway | SCREEN |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | Wafer Transfer Robot x 1 (1 Block System) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | SCREEN SK 80 |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Electrical power | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Process | — | Photo[2] |
| Configuration | — | 4 Cassette Loading Port[2] |
| Cassette Index Station | — | 4 Side Loading[2] |
| Wafer size | — | Wafer Transfer Robot x 1 (1 Block System)[2] |
| PR Resist Pump | — | Iwaki Bellows Pump 4 Set Per 1 Spin Unit[2] |
| Wafer Flow Direction | — | Right to Left[2] |
| Voltage | — | 100V, 3.5 kW[3] |
| Main Body | — | CCD, ETU, TCU, Power Unit (USA)[3] |
| OEM | — | SCREEN / DNS[2] |
| Model | — | SK 80 BW-AVPE[2] |
| Equipment type | — | Coater / Developer[2] |
| Cassette loading port | — | 4 cassette loading port[2] |
| Layout | — | 2 coater & 2 developer layout[2] |
| Wafer transfer | — | Wafer Transfer Robot x 1 (1 Block System)[2] |
| Main body components | — | CCD, ETU, TCU, Power (USA)[2] |
| Power | — | 100V, 3.5 kW; 208V, 9.4 kW; 208V, 8.4 kW[3] |
| Vintage | — | 1995[2] |
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